Dusty Plasma Studies in the Gaseous Electronics Conference Reference Cell
نویسندگان
چکیده
منابع مشابه
Dusty Plasma Studies in the Gaseous Electronics Conference Reference Cell
Particle "dust" in processing plasmas is of critical concern to the semiconductor industry because of the threat particles pose to device yield. A number of important investigations into the formation, growth, charging, transport and consequences of particulate dust in plasmas have been made using the Gaseous Electronics Conference Reference Cell as the reactor test-bed. The greatest amount of ...
متن کاملOptical Diagnostics in the Gaseous Electronics Conference Reference Cell
A number of laser-induced fluorescence and absorption spectroscopy studies have been conducted using Gaseous Electronics Conference Reference Cells. Laser-induced fluorescence has been used to measure hydrogen atom densities, to measure argon metastable spatial profiles, to determine the sheath electric field, and to infer the electron density and temperature. Absorption spectroscopy, using lam...
متن کاملThe Gaseous Electronics Conference RF Reference Cell—An Introduction
This paper provides an introduction to the Gaseous Electronics Conference (GEC) RF Reference Cell, and to the articles published in this Special Issue of the Journal of Research of the National Institute of Standards and Technology. A brief summary of the history and purpose of the Reference Cell concept is presented, and recent changes to the GEC Cell design are documented. The paper concludes...
متن کاملStudies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference RF Reference Cell
A review is presented of kinetic-energy distribution measurements for ions striking grounded surfaces in a Gaseous Electronics Conference (GEC) rf Reference Cell. Two experimental arrangements that have been used to measure ion energies in the GEC Cell are described, and a comparison of their performance under different operating conditions is presented. Significant results from ion-energy anal...
متن کاملAn Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell
In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed in argon, chlorine, and nitrogen at pressures from 0.1 Pa to 3 Pa. For powers deposited in the pl...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Research of the National Institute of Standards and Technology
سال: 1995
ISSN: 1044-677X
DOI: 10.6028/jres.100.034